X-ray lithography patterning of magnetic materials and their characterization

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3802-3806

  Candeloro, Patrizio ^a   Kumar, Rakesh ^a   Altissimo, Matteo ^a   Businaro, Luca ^a   Di Fabrizio, Enzo ^a   Conti, Massimo ^a,b   Gubbiotti, Gianluca ^a,b   Carlotti, Giovanni ^a,b   Gerardino, Annamaria ^a,c   Zivieri, Roberto ^a,d   Donzelli, Onofrio ^a,d  

^a LABORATORIO TASC   (Italy)

^b UNIVERSITY OF PERUGIA   (Italy)

^c IFN CNR   (Italy)

^d UNIVERSITY OF FERRARA   (Italy)

Author keywords

BLS measurement; Magneto optical Kerr effects; Micro magnetic simulation; Permalloy material; X ray lithography

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; HYSTERESIS; LIGHT SCATTERING; MAGNETIC ANISOTROPY; MAGNETIC MATERIALS; OPTICAL KERR EFFECT;

SHAPE ANISOTROPY;

LITHOGRAPHY;

EID: 12444269102     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3802     Document Type: Conference Paper

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