Electron-beam lithography patterning of magnetic nickel films

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 931-937

  Gerardino, A ^a   Di Fabrizio, E ^a   Nottola, A ^a   Cabrini, S ^a   Giannini, G ^a   Mastrogiacomo, L ^a   Gubbiotti, G ^a   Candeloro, P ^a   Carlotti, G ^a  

^a CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MAGNETIC ANISOTROPY; MAGNETIC DOMAINS; MASKS; METALLIC FILMS; NICKEL; OPTICAL KERR EFFECT; X RAY LITHOGRAPHY;

MAGNETIC CHARACTERISATION;

MAGNETIC FILMS;

EID: 0035450505     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00474-9     Document Type: Article

References (8)