Evolution of surface roughness during metal suicides phase transformation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 1, 2004, Pages 122-128

  Pang, C H ^a   Hing, P ^a   Zhao, F F ^b   See, A ^c   Chong, Y F ^c   Lee, P S ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETISM; ATOMIC FORCE MICROSCOPY; FILM GROWTH; GRAIN GROWTH; INTERFACES (MATERIALS); METALLIZING; NUCLEATION; PHASE TRANSITIONS; SURFACE ROUGHNESS;

PHASE FORMATION; SHEET RESISTANCE;

SILICON COMPOUNDS;

EID: 1242352023     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1636158     Document Type: Article

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