Improved analysis of low frequency noise in polycrystalline silicon thin-film transistors

Solid-State Electronics

Volumn 49, Issue 3, 2005, Pages 513-515

  Tassis, D H ^a   Hastas, N A ^a   Dimitriadis, C A ^a   Kamarinos, G ^b  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^b IMEP LAHC   (France)

Author keywords

Noise; Polysilicon; TFTs

Indexed keywords

ELECTRIC POTENTIAL; INTERFACES (MATERIALS); NATURAL FREQUENCIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; POLYSILICON; SEMICONDUCTING SILICON; SPECTRUM ANALYSIS; THIN FILM TRANSISTORS;

EXCIMER LASER ANNEALING (ELA); GRAIN DEFECTS; POLYSILICON ACTIVE LAYERS; SOLID PHASE CRYSTALLIZATION (SPC);

SPURIOUS SIGNAL NOISE;

EID: 12344321958     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2004.11.023     Document Type: Article

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