Molecular beam mass spectrometry system for characterization of thermal plasma chemical vapor deposition

Plasma Chemistry and Plasma Processing

Volumn 24, Issue 3, 2004, Pages 353-372

  Park, Soonam ^a   Liao, Feng ^a   Larson, John M ^a,b   Girshick, Steven L ^a   Zachariah, Michael R ^a  

^a University of Minnesota   (United States)

^b Spinnaker Semiconductor   (United States)

Author keywords

Chemical vapor deposition; Mass spectrometry; Thermal plasma

Indexed keywords

BORON CARBIDE; BOUNDARY LAYERS; CHEMICAL VAPOR DEPOSITION; FLUORESCENCE; GAS CHROMATOGRAPHY; MASS SPECTROMETRY; MOLECULAR BEAM EPITAXY; PLASMAS; SILICON CARBIDE; THIN FILMS;

MASS DISCRIMINATION; MOLECULAR BEAM MASS SPECTROMETRY (MBMS); THERMAL PLASMA; THRESHOLD IONIZATION;

GAS DYNAMICS;

EID: 12344295271     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-004-2273-1     Document Type: Article

References (26)

1. J. M. Larson, M. T. Swihart, and S. L. Girshick, Diamond Relat. Mater. 8, 1863 (1999).
2. M. R. Zachariah and D. Burgess Jr., J. Aeros. Sci. 25, 487 (1994).
3. M. R. Zachariah and O. I. Smith, Combust. Flame 69, 125 (1987).
4. O. Sanogo and M. R. Zachariah, J. Electrochem. Soc. 144, 2919 (1997).
5. H. Toyoda, H. Kojima, and H. Sugai, Appl. Phys. Lett. 54, 1507 (1989).
6. W. L. Hsu and D. M. Tung, Rev. Sci Instrum 63, 4138 (1992).
7. W. L. Hsu, M. C. McMaster, M. E. Coltrin, and D. S. Dandy, Jpn. J. Appl. Phys. 33, 2231 (1994).
8. P. G. Greuel, J. T. Roberts, and D. W. Ernie, in Proc. 12th Int. Symp. Plasma Chemistry, Minneapolis, 21-25 August, 1995, Vol. 3, p. 2209.
9. F. Liao, S. Park, J. M. Larson, M. R. Zachariah, and S. L. Girshick, Mater. Lett. 57, 1982 (2003).
10. A. Kantrowitz and J. Grey, Reo. Sci. Instrum. 22, 328 (1951).
11. E. L. Knuth, Engine Emissions: Pollutant Formation and Measurement (G. S. Springer and D. J. Patterson, eds.), Plenum, New York, 1973, pp. 319-363.
12. D. R. Miller, Atomic and Molecular Beam Methods, Vol. 1 (G. Scoles, ed.), Oxford University, New York, 1988, Chap. 2.
13. M. T. Bieberich and S. L. Girshick, Plasma Chem. Plasma Process. 16, 157S (1996).
14. M. Mitchner and C. H. Kruger, Partially Ionized Gases, John Wiley & Sons, 1973, p. 112.
15. J. B. Anderson, AlChE J. 13, 1188 (1967).
16. P. C. Wateraman and S. A. Stern, J. Chem. Phys. 31, 405 (1959).
17. V. H. Reist and J. B. Fenn, J. Chem. Phys. 39, 3240 (1963).
18. F. S. Sherman, Phys. Fluids 8, 773 (1965).
19. P. K. Sharma, E. L. Knuth, and W. S. Young, J. Chem. Phys. 64, 4345 (1976).
20. E. L. Knuth, Combust. Flame 103, 171 (1995).
21. J. B. Anderson, Molecular Beam and Low Density Gas Dynamics (P. P. Wegener, ed.), Dekker, New York, 1974, Chap. 1.
22. H. Ashkenas and F. S. Sherman, Rarefied Gas Dynamics, Vol. 2 (J. J. de Leeuw, ed.), Academic Press, New York, 1966, pp. 84-105.
23. S. S. Dijulio and E. L. Knuth, Rev. Sci. Instr. 55, 1154 (1984).
24. Electron-Impact Ionization Cross Sections Database, NIST, http://physics.nist.gov/PhysRefData/Ionization/Xsection.html.
25. M. Probst, H. Deutsch, K. Becker, and T. D. Mark, Int. J. Mass Spectrom. Ion Proc. 206, 13 (2001).
26. Electron Collision Cross sections and Databases, http://www.cfdrc.com/ ~cfdplasma/ NASA_coll.html.