Highly efficient silver patterning without photo-resist using simple silver precursors

Materials Science and Engineering: B

Volumn 117, Issue 1, 2005, Pages 11-16

  Byun, Younghun ^a   Hwang, Eoc Chae ^a   Lee, Sang Yun ^a   Lyu, Yi Yeol ^a   Yim, Jin Heong ^a   Kim, Jin Young ^a   Chang, Seok ^a   Pu, Lyong Sun ^a,b   Kim, Ji Man ^c  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Sungkyunkwan University   (South Korea)

^c Ajou University   (South Korea)

Author keywords

Annealing; Organo silver complex; Photolysis; Silver micro patterning; Thin film; UV irradiation

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY; LIQUID CRYSTAL DISPLAYS; MICROELECTRONICS; PHOTOLYSIS; PHOTORESISTS; PHOTOSENSITIVITY; THIN FILMS; ULTRAVIOLET RADIATION;

ORGANO-SILVER COMPLEX; PHOTOCHEMICAL DECOMPOSITION; SILVER MICRO-PATTERNING; UV IRRADIATION;

SILVER;

EID: 12344292654     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.10.005     Document Type: Article

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