Molecular design for photo and electron beam lithography with thin films of coordination compounds

Materials Chemistry and Physics

Volumn 43, Issue 3, 1996, Pages 233-237

  Hill, R H ^a   Avey, A A ^a   Blair, S L ^a   Gao, M ^a   Palmer, B J ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Electron beam; Lithography; Photochemistry

Indexed keywords

DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; INORGANIC COMPOUNDS; MASKS; METALLIC FILMS; MOLECULES; PHOTOCHEMICAL REACTIONS; PHOTOLYSIS; THIN FILMS; ULTRAVIOLET RADIATION;

COORDINATION COMPLEXES; COORDINATION COMPOUNDS; INORGANIC COMPLEXES; PHOTODEPOSITION; ULTRAVIOLET EXPOSURE;

PHOTOLITHOGRAPHY;

EID: 0030110040     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/0254-0584(95)01635-8     Document Type: Article

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