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Volumn 59, Issue 6, 2005, Pages 690-693

Chemical effects in chemical mechanical planarization of TaN: Investigation of surface reactions in a peroxide-based alkaline slurry using Fourier transform impedance spectroscopy

Author keywords

CMP; Electronic materials; Impedance spectroscopy; Surfaces; Tantalum; Tantalum nitride

Indexed keywords

COMPOSITE MATERIALS; DIFFUSION; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; MICROPROCESSOR CHIPS; PEROXIDES; PH EFFECTS; SEMICONDUCTOR MATERIALS; SILICON WAFERS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; SURFACE ROUGHNESS; THIN FILMS;

EID: 12244313915     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.11.010     Document Type: Article
Times cited : (26)

References (14)
  • 1
    • 12244279259 scopus 로고    scopus 로고
    • Chemical-Mechanical Polishing S.V. Babu K.C. Cadien H. Yano Materials Research Society Warrendale
    • Chemical-Mechanical Polishing S.V. Babu K.C. Cadien H. Yano Advances and Future Challenges 2001 Materials Research Society Warrendale
    • (2001) Advances and Future Challenges
  • 4
    • 12244293584 scopus 로고    scopus 로고
    • http://www.clarkson.edu/~surop/.
  • 12


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.