Original and sputtering induced interface roughness in AES sputter depth profiling of SiO2/Ta2O5 multilayers

Thin Solid Films

Volumn 355, Issue , 1999, Pages 390-394

  Rar, A ^a   Kojima, I ^b   Moon, D W ^c   Hofmann, S ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b NATL INST OF MAT AND CHEM RES   (Japan)

^c Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFACES (MATERIALS); MULTILAYERS; SILICA; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TANTALUM COMPOUNDS;

GRAZING INCIDENCE X-RAY REFLECTIVITY (GIXR); MIXING ROUGHNESS INFORMATION MODEL; SPUTTER DEPTH PROFILING;

THIN FILMS;

EID: 0033364587     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00456-3     Document Type: Article

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