Develop process optimization for CD uniformity improvement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 540-548

  Shin, J C ^a   Won, J I ^a   Jung, H Y ^a   Kim, M S ^a   Choi, Y K ^a   Han, O ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

CD Uniformity; Fogging effect; Local area; Puddle type develop; Resist thickness uniformity; Single type develop

Indexed keywords

DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ERROR ANALYSIS; OPTIMIZATION; PHOTORESISTS; PLASMA SPRAYING; PROBLEM SOLVING; PROCESS CONTROL; SPRAYED COATINGS;

FOGGING EFFECTS; MASK ERROR FACTORS (MEF);

MASKS;

EID: 0035043128     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410735     Document Type: Conference Paper

References (2)