Plasma and plume effects on UV laser ablation of polymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5448, Issue PART 1, 2004, Pages 572-580

  Ihlemann, Jürgen ^a   Beinhorn, Frank ^a   Schmidt, Henning ^a   Luther, Klaus ^b   Troe, Jürgen ^b  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^b UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Femtosecond; Nanosecond; Picosecond; Plasma; Plume; Polymer; UV laser ablation

Indexed keywords

DATA REDUCTION; LASER ABLATION; LIGHT ABSORPTION; MATHEMATICAL MODELS; OPACITY; PLASMAS; ULTRAVIOLET RADIATION;

FEMTOSECOND; NANOSECOND; PICOSECOND; PLUMES; UV LASER ABLATION;

POLYMETHYL METHACRYLATES;

EID: 11844296066     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.548153     Document Type: Conference Paper

References (33)

1. H. Schmidt, J. Ihlemann, B. Wolff-Rottke, K. Luther, J. Troe: J. Appl. Phys. 83, 5458 (1998).
2. R.S. Taylor, D.L. Singleton, G. Paraskevopoulos: Appl. Phys. Lett. 50, 1779 (1987).
3. M. Himmelbauer, E. Arenholz, D. Bäuerle: Appl. Phys. A 63, 87 (1996).
4. P. Simon, J. Ihlemann: Appl. Phys. A 63, 505 (1996).
5. J. Krüger, W. Kautek, M. Lenzner, S. Sartania, C. Spielmann, F. Krausz: Proc. SPIE Vol. 2991, 40 (1997).
6. D. Ashkenasi, H. Varel, A. Rosenfeld, F. Noack, E.E.B. Campbell: Appl. Phys. A 63, 103 (1996).
7. F. Beinhorn, J. Ihlemann, K. Luther, J. Troe: Appl. Phys. A (in press).
8. P. Schwab, J. Heitz, S. Proyer, D. Bäuerle, P. Simon: Appl. Phys. A 53, 282 (1991).
9. J. Krüger, W. Kautek: Proc. SPIE 2403, 436 (1995).
10. H.M. Phillips, R.A. Sauerbrey: Opt. Engineering 32, 2424 (1993).
11. S. Preuss, E. Matthias, M. Stuke: Appl. Phys. A 59, 79 (1994).
12. S. Preuss, M. Späth, Y. Zhang, M. Stuke: Appl. Phys. Lett. 62, 3049 (1993).
13. J. Ihlemann, B. Wolff-Rottke, P. Simon: Appl. Phys. A 54, 363 (1992).
14. S. Preuss, M. Stuke: Appl. Phys. Lett. 67, 338 (1995).
15. D. Ashkenasi, H. Varel, A. Rosenfeld, F. Noack, E.E.B. Campbell: Nucl. Instr. Meth. Phys. Res. B 122, 359 (1997).
16. R. Srinivasan, E. Sutcliffe, B. Braren: Appl. Phys. Lett. 51, 1285 (1987).
17. S. Küper, M. Stuke: Appl. Phys. B 44, 199 (1987).
18. G. Koren: Appl. Phys. Lett. 50, 1030 (1987).
19. X. Mao, R.E. Russo: Appl. Phys. A 64, 1 (1997).
20. B. Burghardt, S. Scheede, R. Senczuk, H.-J. Kahlert: Appl. Phys. A 69, S137 (1999).
21. Z. Bor, B. Racz, G. Szabo, D. Xenakis, C. Kalpouzos, C. Fotakis: Appl. Phys. A 60, 365 (1995).
22. B. Hopp, Z. Tóth, K. Gál, Á. Mechler, Zs. Bor, S.D. Moustaizis, S. Georgiou, C. Fotakis: Appl. Phys. A 69, S191 (1999).
23. C.R. Phipps, Jr., T.P. Turner, R.F. Harrison, G.W. York, W.Z. Osborne, G.K. Andersen, X.F. Corlis, L.C. Haynes, H.S. Steele, K.C. Spicochi, T.R. King: J. Appl. Phys. 64, 1083 (1988).
24. R. Fedosejevs, R. Ottmann, R. Sigel, G. Kühnle, S. Szatmári, F.P. Schäfer: Phys. Rev. Lett. 64, 1250 (1990).
25. M.M. Murnane, H.C. Kapteyn, R.W. Falcone: Phys. Rev. Lett. 62, 155 (1989).
26. S. Kubodera, K. Midorikawa, H. Tashiro, K. Toyoda: Appl. Phys. Lett. 66, 133 (1995).
27. H.C. Liu, X.L. Mao, J.H. Yoo, R.E. Russo: Appl. Phys. Lett. 75, 1216 (1999).
28. D. Riley, A.J. Langley, P.F. Taday, W. Shaikh, I. McCormack: J. Phys. D: Appl. Phys. 31, 515 (1998).
29. Ch. Ziener, P.S. Foster, E.J. Divall, C.J. Hooker, M.H.R. Hutchinson, A.J. Langley, D. Neely: J. Appl. Phys. 93, 768 (2003).
30. S. Szatmári, F.P. Schäfer: Opt. Commun. 68, 196 (1988).
31. E.B. Treacy: IEEE J. Quant. Electr. QE 5, 454 (1969).
32. Z. Bor, B. Racz: Opt. Commun. 54, 165 (1985).
33. J.F. Frisoli, Y. Hefetz, T.F. Deutsch: Appl. Phys. B 52, 168 (1991).