Scanning capacitance microscopy applied to two-dimensional dopant profiling of semiconductors

Materials Science and Engineering B

Volumn 44, Issue 1-3, 1997, Pages 46-51

  Kopanski, Joseph J ^a   Marchiando, Jay F ^a   Lowney, Jeremiah R ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Dopant profiles; Semiconductors; Silicon

Indexed keywords

FINITE ELEMENT METHOD; HETEROJUNCTIONS; IMAGE QUALITY; MATHEMATICAL MODELS; SEMICONDUCTOR DOPING;

DOPANT PROFILES; SCANNING CAPACITANCE MICROSCOPY (SCM);

SEMICONDUCTOR MATERIALS;

EID: 0002373959     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01797-7     Document Type: Article

References (14)

1. R.M. Feenstra and J.E. Griffith, in W.M. Bullis, D.G. Seiler, and A.C. Diebold, (eds.), Semiconductor Characterization: Present Status and Future Needs, AIP Press, Woodbury, NY, 1996, p. 295.
2. C.C. Williams, W.P. Hough, and S.A. Riston, Appl. Phys. Lett., 55 (1989) 203.
3. Y. Huang and C.C. Williams, J. Vac. Sci. Technol., B12 (1994) 369.
4. J.J. Kopanski, J.F. Marchiando and J.R. Lowney, J. Vac. Sci. Technol., B14 (1996) 242.
5. G. Neubauer, A. Erickson, C.C. Williams, J.J. Kopanski, M. Rodgers and D. Adderton, J. Vac. Sci. Technol., B14 (1996) 426.
6. The National Technology Roadmap for Semiconductors, Semiconductor Industry Association, 4300 Stevens Creek Boulevard, San Jose, CA.
7. J.K. Clemens, RCA Rev., 39 (1978) 33.
8. R.C. Palmer, E.J. Denlinger and H. Kawamoto, RCA Rev., 43 (1982) 194.
9. Y. Huang, C.C. Williams and H. Smith, J. Vac. Sci. Technol., B14 (1996) 433.
10. A.S. Grove, B.E. Deal, E.H. Snow and C.T. Sah, Solid State Electron., 8 (1965) 145.
11. J.F. Marchiando, Intl. J. Num. Meth. Eng., 39 (1996) 1029; J. Res. Inst. Stand. Technol., 100 (1995) 661.
12. J.F. Marchiando, Intl. J. Num. Meth. Eng., 39 (1996) 1029; J. Res. Inst. Stand. Technol., 100 (1995) 661.
13. J.F. Marchiando, J.J. Kopanski and J.R. Lowney, Proc. Scanning Microscopy International 1996, Bethesda, Maryland, May 1996.
14. W.F. Tseng, J.A. Dagata, R.M. Silver and J.R. Lowney, J. Vac. Sci. Technol., B12 (1994) 373.