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Volumn 102, Issue 3, 2005, Pages 215-219
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A simple electron-beam lithography system
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Author keywords
e Beam lithography; Electron optics; Electron beam deposition; Electron beam induced deposition; SEM
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Indexed keywords
ELECTRON-BEAM DEPOSITION;
ELECTROSTATIC DEFLECTOR PLATE SYSTEM;
THREE-DIMENSIONAL (3D) NANOSTRUCTURES;
ELECTRODEPOSITION;
ELECTRON BEAMS;
ELECTROSTATICS;
IMAGE RECONSTRUCTION;
NANOSTRUCTURED MATERIALS;
NANOTECHNOLOGY;
OPTICAL RESOLVING POWER;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
THREE DIMENSIONAL;
ELECTRON BEAM LITHOGRAPHY;
ANALYTIC METHOD;
ARTICLE;
CALCULATION;
ELECTRON;
ELECTRON BEAM;
NANOTECHNOLOGY;
SCANNING ELECTRON MICROSCOPY;
THEORETICAL STUDY;
EQUIPMENT DESIGN;
MICROSCOPY, ELECTRON, SCANNING;
NANOTECHNOLOGY;
OPTICS;
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EID: 11444260559
PISSN: 03043991
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ultramic.2004.09.011 Document Type: Article |
Times cited : (9)
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References (18)
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