Soft X-ray optimization studies on a dense plasma focus device operated in neon and argon in repetitive mode

IEEE Transactions on Plasma Science

Volumn 32, Issue 6, 2004, Pages 2227-2235

  Wong, D ^a   Patran, A ^a   Tan, T L ^a   Rawat, R S ^a   Lee, P ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Argon; Neon; Plasma focus; Resists; X ray lithography; X rays

Indexed keywords

ARGON; MICROMACHINING; NEON; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; SPECTROMETERS; X RAY LITHOGRAPHY; X RAYS;

PLASMA FOCUS; SOFT X RAYS;

PLASMA DEVICES;

EID: 11244329068     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2004.838596     Document Type: Article

References (28)

1. P. J. Silverman, "The intel lithography roadmap," Intel Tech. J. vol. 6. no. 2, p. 55, 2002.
2. R. L. Brainard, G. G. Barclay, E. H. Anderson, and L. E. Ocola, "Resists for next generation lithography," Microelectron. Eng., vol. 61-62, p. 707, 2002.
3. H. Ito, "Chemical amplification resists: History and development within IBM," IBM J. Res. Devel., vol. 41, p. 69, 1997.
4. H. Ito, "Functional polymers for microlithography: Chemically amplified imaging systems," in Desk Reference of Fanctional Polymers, Syntheses and Applications, R. Arshady, Ed. Washington, D.C.: Amer. Chem. Soc., 1997, pp. 341-369.
5. Y. Kato and S. H. Be, "Generation of soft x-rays using a rare gas-hydrogen plasma focus and its application to x-ray lithography," Appl. Phys. Lett., vol. 48, no. 11, p. 686, 1986.
6. W. Neff, J. Eberle, R. Holz, R. Lebert, and F. Richter, The plasma focus as soft X-ray source for microscopy and lithography, 1989, vol. 1140, Proc. SPIE (X-Ray Instrument), p. 13.
7. P. G. Burkhalter, G. Mehlman, D. A. Newman, M. Krishnan, and R. R. Prasad, "Quantitative x-ray emission from a DPF device," Rev. Sci. Instrum., vol. 63, no. 10, p. 5052, 1992.
8. G. Zhang, "Plasma soft X-ray source for microelectronic lithography," Ph.D. dissertation, Nanyang Tech. Univ., Singapore, 1999.
9. M. Liu, X. Feng, S. V. Springham, and S. Lee, "Soft X-ray yield measurement in a small plasma focus operated in neon," IEEE Trans. Plasma Sci., vol. 26, p. 135, Apr. 1998.
10. S. Lee, P. Lee, G. Zhang, X. Feng, V. A. Gribkov, M. Liu, A. Serban, and T. K. S. Wong, "High rep rate high performance plasma focus as a powerful radiation source," IEEE Trans. Plasma Sci., vol. 26, p. 1119, Aug. 1998.
11. F. N. Beg, I. Ross, A. Lorenz, J. F. Worley, A. E. Danger, and M. G. Hanies, "Study of X-ray emission from a table top plasma focus and its application as an X-ray backlighter," J. Appl. Phys., vol. 88, p. 3225, 2000.
12. M. Zakaullah, K. Alamgir, M. Shafiq, S. M. Hassan, M. Sharif, S. Hussain, and A. Waheed, "Characteristics of X-rays from a plasma focus operated with neon gas," Plasma Sources Sci. Tech., vol. 11, p. 377, 2002.
13. S. H. Kim, D.-E. Kim, and T. N. Lee, "Soft X-ray spectroscopic study of a gas-puff Z-pinch argon plasma," IEEE Trans. Plasma Sci., vol. 26, p. 1108, Aug. 1998.
14. V. A. Gribkov, A. Srivastava, P. L. C. Keat, V. Kudryashov, and S. Lee, "Operation of NX2 dense plasma focus device with argon filling as a possible radiation source for micro-maching," IEEE Trans. Plasma Sci., vol. 30, p. 1331, June 2002.
15. M. Zakanllah, K. Alamgir, M. Shafiq, M. Sharif, and A. Waheed, " Scope of plasma focus with argon as a soft X-ray source," IEEE Trans. Plasma Sci., vol. 30, p. 2089, Dec. 2002.
16. J. D. Huba, NRL Plasma Formulary. Washington, DC: Plasma Phys. Div. Navel Res. Lab., 2002, p. 47.
17. J. W. Mather, "Formation of a high-density deuterium plasma focus," Phys. Fluids, vol. 8, p. 366, 1965.
18. M. Zakanllah, I. Ahmad, A. Omar, G. Murtaza, and M. M. Beg, " Effects of anode shape on plasma focus operation with argon," Plasma Sources Sci. Tech., vol. 5, p. 544, 1996.
19. A. Serban and S. Lee, "Experiments on speed-enhanced neutron yield from a small plasma focus," J. Plasma Phys., vol. 60, p. 3, 1998.
20. S. Bing, "Comparative study of dynamics and X-ray emission of several plasma focus devices," Ph.D. dissertation, Nanyang Tech. Univ., Singapore, 2000.
21. S. Lee, P. Lee, M. Liu, V. Kudryashov, and T. L. Tan, "High energy photon lithography for fabrication of photonic device," in Proc. SPIE, vol. 3899, 1999, p. 247.
22. W. Wang, A. Patran, S. Lee, and P. Lee, "Simple, effective multichannel pin diode X-ray spectrometer system," Sing. J. Phys., vol. 17, no. 1, p. 27, 2001.
23. T. Yanagidaira, T. Yamamoto, B. Shan, and K. Hirano, "Spectroscopic investigation of z-pinch with a spatial and temporal resolution," J. Phys. Soc. Jpn., vol. 68, p. 852, 1999.
24. B. L. Henke, E. M. Gullikson, and J. C. Davis, "X-ray interactions: Photoabsorption, scattering, transmission, and reflection at E = 50-30 000 eV. Z = 1-92," Atomic Data Nuclear Data Tables, vol. 54, p. 181, 1993.
25. M. Liu, "Soft X-ray from plasma focus," Ph.D. dissertation, Nanyang Tech. Univ., Singapore, 1997.
26. S. Lee and A. Serban, "Dimensions and lifetime of the plasma focus pinch," IEEE Trans. Plasma Sci., vol. 24, p. 1101, June 1996.
27. Energy Storage Compression, and Switching, vol. 2, D. C. Gates, V. Nardi, H. Sahlin, and W. H. Bostick, Eds., Plenum, New York, 1978, p. 329.
28. T. L. Tan, D. Wong, P. Lee, R. S. Rawat, and A. Patran, "Study of a chemically-amplified resist for X-ray lithography by FT-IR spectroscopy," Appl. Spect., vol. 58, no. 11, p. 438, Nov. 2004.