A kinetic Monte Carlo simulation of film growth by physical vapor deposition on rotating substrates

Materials Science and Engineering: A

Volumn 391, Issue 1-2, 2005, Pages 390-401

  Cho, J ^a,b   Terry, S G ^a   LeSar, R ^a,c   Levi, C G ^a  

^a University of California   (United States)

^b State University of New York   (United States)

^c LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

Film growth; Kinetic Monte Carlo; Microstructure evolution; Physical vapor deposition; Thermal barrier coatings

Indexed keywords

AIRFOILS; ALGORITHMS; ANISOTROPY; COMPUTER SIMULATION; CRYSTAL ATOMIC STRUCTURE; KINETIC ENERGY; MICROSTRUCTURE; MONTE CARLO METHODS; POROSITY; RANDOM PROCESSES; SUBSTRATES; THERMAL BARRIER COATINGS; VAPOR DEPOSITION;

CHANGING VAPOR INCIDENCE ANGLE; ROTATING SUBSTRATES;

THIN FILMS;

FILM; MONTE CARLO SIMULATION; VAPOR DEPOSITION;

EID: 11244283875     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2004.09.015     Document Type: Article

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