Si(100) wafers cleaned by laser ablation

International Journal of Modern Physics B

Volumn 18, Issue 23-24, 2004, Pages 3169-3176

  Cruz, M P ^a   Diaz J A ^a   Siqueiros, J M ^a  

^a CENTRO DE CIENCIAS DE LA MATERIA CONDENSADA   (Mexico)

Author keywords

Laser cleaning; Laser etching; Laser removal; Silicon related materials; Silicon surfaces

Indexed keywords

CARBON; OXIDE; SILICON;

ARTICLE; AUGER ELECTRON SPECTROSCOPY; CLEANING; ELLIPSOMETRY; LASER; OXIDATION; ROOM TEMPERATURE; ULTRAVIOLET RADIATION;

EID: 11244254122     PISSN: 02179792     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0217979204026421     Document Type: Article

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