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Volumn 62, Issue 2, 1996, Pages 103-114

KrF-excimer-laser-induced native oxide removal from Si(100) surfaces studied by Auger electron spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON SPECTROSCOPY; LASER APPLICATIONS; MORPHOLOGY; OXIDES; SEMICONDUCTING SILICON; SURFACE CLEANING; SURFACE TREATMENT; SURFACES;

EID: 0030085572     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF01575708     Document Type: Article
Times cited : (19)

References (54)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.