Application of a multilayered magnetostrictive film to a micromachined 2-D optical scanner

Journal of Microelectromechanical Systems

Volumn 13, Issue 2, 2004, Pages 264-271

  Debray, Alexis ^a   Ludwig, Alfred ^b   Bourouina, Tarik ^a   Asaoka, Akira ^c   Tiercelin, Nicholas ^a   Reyne, Gilbert ^a   Oki, Takahiko ^c   Quandt, Eckhard ^b   Muro, Hideo ^c   Fujita, Hiroyuki ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b CENTER OF ADVANCED EUROPEAN STUDIES AND RESEARCH CAESAR   (Germany)

^c NISSAN MOTOR CO   (Japan)

Author keywords

Electromagnetic forces; Magnetostrictive devices; MEMS technologies; Optical scanner

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC FIELDS; FINITE ELEMENT METHOD; INDUSTRIAL APPLICATIONS; MAGNETIC FIELDS; MAGNETIC FILMS; MAGNETOSTRICTION; MIRRORS; MULTILAYERS; NATURAL FREQUENCIES; OPTICAL DESIGN;

ELECTROMAGNETIC FORCE; OPTICAL DEFLECTION ANGLES; OPTICAL SCANNER;

OPTICAL DEVICES;

EID: 11144357318     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2004.825534     Document Type: Article

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