LPV control for a wafer stage: Beyond the theoretical solution

Control Engineering Practice

Volumn 13, Issue 2, 2005, Pages 231-245

  Groot Wassink, Matthijs ^a   van de Wal, Marc ^b   Scherer, Carsten ^a   Bosgra, Okko ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Feedback control; Gain scheduling; LPV modeling; LPV synthesis; Mechatronics; Motion control; Position dependent dynamics; Servo systems

Indexed keywords

CLOSED LOOP CONTROL SYSTEMS; DYNAMICS; ELECTROMECHANICAL DEVICES; INTEGRATED CIRCUITS; PARAMETER ESTIMATION;

CONTROLLER STRUCTURES; LINEAR PARAMETER VARYING (LPV); POSITIONING DEVICES; WAFER SCANNER;

CONTROL EQUIPMENT;

CONTROL SYSTEM;

EID: 11144295613     PISSN: 09670661     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.conengprac.2004.03.008     Document Type: Article

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