Thermal treatments and gas adsorption influences on nanomechanics of ultra-thin silicon resonators for ultimate sensing

Nanotechnology

Volumn 15, Issue 12, 2004, Pages 1851-1854

  Wang, Dong F ^a,b   Ono, Takahito ^c   Esashi, Masayoshi ^c  

^a ISHINOMAKI SENSHU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GAS ADSORPTION; HEAT TREATMENT; NANOTECHNOLOGY; SILICON; SURFACE PROPERTIES;

MECHANICAL COMPONENTS; NANOMECHANICS; SINGLE-CRYSTAL SILICON (SCS); SURFACE EFFECTS;

RESONATORS;

EID: 11144279941     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/12/028     Document Type: Article

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