Nanolithography by means of an electrochemical scanning capillary microscope

Journal of the Electrochemical Society

Volumn 151, Issue 11, 2004, Pages

  Staemmler, L ^a,b   Suter, T ^a,c   Bohni H ^a  

^a ETH ZURICH   (Switzerland)

^b Hahn Schickard Inst MT   (Germany)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; AUGER ELECTRON SPECTROSCOPY; ELECTROCHEMISTRY; ENERGY DISPERSIVE SPECTROSCOPY; MICROANALYSIS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY;

SCANNING CAPILLARY MICROSCOPE; SCANNING ELECTROCHEMICAL MICROSCOPE (SECM); SILICON CRYSTALS; SUBMICROMETERS;

NANOTECHNOLOGY;

EID: 10944258952     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1803834     Document Type: Article

References (25)

1. A. J. Bard, F.-R. F. Fan, J. Kwak, and O. Lev, Anal. Chem., 61, 132 (1989).
2. P. K. Hansma, B. Drake, O. Marti, S. A. C. Gould, and C. B. Prater, Science. 243, 641 (1989).
3. G. Binnig and H. Rohrer, Helv. Phys. Acta. 55, 726 (1982).
4. H. Siegenthaler, STM in Electrochemistry, 1st ed., Chap. 2, p. 7, Surface Sciences, Springer, Berlin (1992).
5. A. A. Gewirth and B. K. Niece, Chem. Rev. (Washington, D.C.), 97, 1129 (1997).
6. O. Voigt, B. Davepon, G. Staikov, and J. Schultze, Electrochim. Acta, 44, 3731 (1999).
7. A. Spiegel, L. Staemmler, M. Döbeli, and P. Schmuki, J. Electrochim. Soc., 149, C432 (2002).
8. A. J. Bard, D. E. Cliffel, C. Demaille, F.-R. F. Fan, and M. Tsionsky, Ann. Chim. (Rome), 87, 15 (1997).
9. O. E. Hüsser, D. H. Craston, and A. J. Bard, J. Electrochem. Soc., 136, 3222 (1989).
10. D. Mandler and A. J. Bard, J. Electrochem. Soc., 137, 1079 (1990).
11. C. Kranz, M. Ludwig, H. E. Gaub, and W. Schuhmann, Adv. Mater. (Weinheim, Ger.), 7, 38 (1995).
12. C. Kranz, M. Hiller, P. Bäuerle, H. E. Gaub, and W. Schuhmann, in 8th International Conference of Solid-State Sensors and Actuators and Eurosensors IX, Vol. 1. p. 506 (1995).
13. C. B. Prater, B. Drake, S. A. C. Gould, H. G. Hansma, and P. K. Hansma, Scanning, 12, 50 (1990).
14. A. D. Müller, F. Müller, and M. Hietschold, Thin Solid Films, 366, 32 (2000).
15. H. Zhang, L. Wu, and F. Huang. J. Vac. Sci. Technol. B, 17, 269 (1999).
16. T. Suter, Ph.D. Thesis, 11962, ETH Zürich (1997).
17. U. Stimming, R. Vogel, T. Will, and D. M. Kolb, J. Power Sources, 43, 169 (1993).
18. L. Staemmler, T. Suter, and H. Böhni, Electrochem. Solid-State Lett., 5. C61 (2002).
19. A. Hengstenberg, C. Kranz, and W. Schuhmann, Chem.-Eur. J., 6, 1547 (2000).
20. M. Büchler, S. C. Kelly, and W. H. Smyrl, Electrochem. Solid-State Lett., 3, 35 (2000).
21. W. U. Schmidt, R. C. Alkire, and A. A. Gewirth, J. Electrochem. Soc., 143, 3122 (1996).
22. M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solution, 2nd ed., National Association of Corrosion Engineers, Houston, TX (1974).
23. C. H. Hamann and W. Vielstich, Elektrochemie, 3rd ed., Wiley-VCH, Weinheim (1998).
24. R. Randler, M. Dietterle, and D. M. Kolb, Z. Phys. Chem. (Munich). 208, 43 (1999).
25. T. Suter and H. Böhni, Electrochim. Acta, 43, 2843 (1998).