Localized electrochemical deposition and dissolution of Cu on microstructured Ti surfaces

Electrochimica Acta

Volumn 44, Issue 21, 1999, Pages 3731-3741

  Voigt, O ^a   Davepon, B ^a   Staikov, G ^a   Schultze, J W ^a  

^a HEINRICH HEINE UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CYCLIC VOLTAMMETRY; DISSOLUTION; ELECTRODEPOSITION; HETEROJUNCTIONS; LASER APPLICATIONS; OPTICAL MICROSCOPY; PHOTORESISTS; SEMICONDUCTOR MATERIALS; SUBSTRATES; SURFACE TREATMENT; TITANIUM OXIDES;

ANODIC DISSOLUTION; CRITICAL OVERPOTENTIAL; LASER INDUCED LOCAL DISSOLUTION; METAL DISSOLUTION; MICROSTRUCTURING; SCANNING AUGER MICROSCOPY;

COPPER;

EID: 0032682068     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(99)00078-X     Document Type: Article

References (14)

1. Menz W., Bley P. Mikrosystemtechnik für Ingenieure. 1993;VCH, Weinheim.
2. Becker E.W., Ehrfeld W., Hagmann P., Maner A., Münchmeyer D. Microelectronic Engineering. 4:1986;35.
3. J.W. Schultze, Electrochemical Microsystem Technologies, Electrochim. Acta 42 (1997) 2981-3406.
4. Schultze J.W., Jung K.G. Electrochim. Acta. 40:1995;1369.
5. Budevski E., Staikov G., Lorenz W.J. Electrochemical Phase Formation and Growth - An Introduction to the Initial Stages of Metal Deposition. 1996;VCH, Weinheim.
6. Arsov L.D. Electrochim. Acta. 30:1985;1645.
7. Kudelka S., Michaelis A., Schultze J.W. Ber. Bunsenges. Phys. Chem. 99:1995;1020.
8. Allongue P., Souteyrand E. J. Electroanal. Chem. 286:1990;217.
9. Allongue P., Souteyrand E. J. Electroanal. Chem. 362:1993;79.
10. Allongue P., Souteyrand E., Allemand L. J. Electroanal. Chem. 362:1993;89.
11. Schultze J.W., Bartels C. J. Electroanal. Chem. 150:1983;583.
12. Leitner K., Schultze J.W., Stimming U. J. Electrochem. Soc. 133:1986;1561.
13. Schultze J.W., Kudelka S. Interface. 6:1997;28.
14. Schultze J.W., Elfenthal L. J. Electroanal. Chem. 204:1986;153.