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Journal of the Electrochemical Society

Volumn 149, Issue 8, 2002, Pages

Selective electrodeposition of Cu nanostructures on focused ion beam sensitized p-Si

(4) Spiegel, A a Staemmler, L b Dobeli M b Schmuki, P c

a EPFL (Switzerland)

b ETH ZURICH (Switzerland)

c UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL DEFECTS; ELECTROCHEMISTRY; GALLIUM; ION BEAMS; ION IMPLANTATION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; POLARIZATION; SILICON WAFERS;

DEIONIZED WATER; FOCUSED ION BEAM; ION FLUENCES; SELECTIVE ELECTROCHEMICAL REACTION;

ELECTRODEPOSITION;

EID: 0036688329 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1490538 Document Type: Article

Times cited : (18)

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