Methods for preparation of BaTiO3 thin films

Journal of Optoelectronics and Advanced Materials

Volumn 6, Issue 4, 2004, Pages 1349-1356

  Cernea, M ^a  

^a NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

Barium titanate; Deposition methods; Thin film

Indexed keywords

BARIUM TITANATE; CRYSTALLIZATION; DEPOSITION; DIELECTRIC PROPERTIES; FERROELECTRICITY; LOW TEMPERATURE EFFECTS; PHASE TRANSITIONS;

CRYSTALLIZED FILMS; DEPOSITION METHODS; FERROELECTRIC BEHAVIOR; TETRAGONAL PHASE TRANSITION;

THIN FILMS;

EID: 10944225148     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (52)

1. P. J. Harrop, D. S. Campbell, Thin Solid Films 2, 273 (1968).
2. F. T. Wooten, Proc. IEEE 55, 564 (1967).
3. R. S. Muller, J. Conragan, IEEE Trans. Electron. Devices ED-12, 590 (1965).
4. J. R. Fiebiger, R. S. Muller, J. Appl. Phys. 38, 1948 (1967).
5. A. B. Kaufman, IEEE Trans. Electron. Devices ED-16, 562 (1969).
6. N. F. Borelli, M. M. Layton, IEEE Trans. Electron. Devices ED-16, 511 (1969).
7. G. W. Taylor, IEEE Trans. Electron. Devices ED-16, 565 (1969).
8. R. F. Bunshah, (Ed.), Deposition Technologies for Films and Coatings, Noyes Pub. Park Ridge, New. Jersey, USA (1982).
9. J. H. Kim, S. Hishita, Journal of Materials Science 30, 4645-4650 (1995).
10. K. Uchino, N. Lee, T. Toba, N. Usuki, H. Aburatani, Y. Ito, J. Ceram. Soc. Jpn. 100 1091 (1992).
11. A. Mansingh, C. V. R. Vasanta Kumar, Journal of Materials Science Letters 7, 1104-1106 (1988).
12. S. B. Desu, J. Electrochem. Soc., 140(10), 2981-2986 (1993).
13. S. B. Desu, Mat. Res. Soc. Symp. Proc. 20, 199 (1990).
14. M. F. Doerner, W. D. Nix, CRC Crit. Rev. Solid State Mater. Sci., 14, 225 (1988).
15. C. B. Samantaray, Anushree Roym M. Roy, M. L. Mukherjee, S. K. Ray, Journal of Physics and Chemistry of Solids 63, 65 (2002).
16. Wen-Chou Tsai, Tseung-Yuen Tseng, J. Am. Ceram. Soc. 81(3), 768 (1998).
17. F. Fujimoto, Y. Kobayashi, K. Kubota, Thin Solid Films 109, 249 (1989).
18. M. Cernea, I. Matei, A. Iuga, C. Logofatu, Journal of Materials Science 36(20), 5027 (2001).
19. M. G. Norton, K. P. B. Cracknell, C. B. Carter, J. Am. Ceram Soc. 75(7), 1999 (1992).
20. Douglas B. Chrisey, Graham K. Hubler, Pulsed Laser Deposition of Thin Films, John Wiley and Sons, Inc., New York, (1994).
21. M. G. Norton, C. B. Carter, J. Mater. Res. 5, 2762 (1990).
22. M. G. Norton, C. Scarfone, J. Li, C. B. Carter, J. W. Mayer, J. Mater. Res. 6, 2022 (1991).
23. C. Scarfone, M. G. Norton, C. B. Carter, J. Li, J. W. Mayer, in Surface Chemistry and Beam-Solid Interactions, Mataterials Research Society Symposium Proceedings, Vol. 201. Edited by H. Atwater, F. A. Houle and D. Lowndes, Materials Reaearch Society, Pittsburg, PA, 1990, p.183-88
24. Y. Nakata, W. K. A. Kumuduni, T. Okada, M. Maeda, Appl. Phys. Lett. 64, 2599 (1994).
25. T. Okada, Y. Nakata, H. Kaibara, M. Maeda, Jpn. J.Appl. Phys. 11B, 1536 (1995).
26. Y. Nakata, H. Kaibara, T. Okada, M. Maeda, J.Appl. Phys. 80, 2458 (1996).
27. Y. Nakata, G. Soumagne, T. Okada, M. Maeda, Appl. Sur. Sci. 127-129, 650 (1998).
28. T. -F. Tseng, M. -H. Yeh, K. -S. Liu and I. -N. Lin, J.Appl. Phys. 80, 4984 (1996).
29. M. Cernea, A. Ianculescu, O. Monnereau, L. Argème, V. Bley, B. Bastide, C. Logofatu, J. Materials Science 39 (8), 2755 (2004).
30. M. Tsukada, M. Mukaida, S. Miyazawa, Jpn. J.Appl. Phys. 35, 4908 (1996).
31. Da-Fu Cui, Hui-Sheng Wang, Zheng-Hao Chen, Yue-Liang Zhou, Hui-Bin Lu, Guo-Zhen Yang, Kun Ma, Hong Chen, Lin Li, Wei Liu, Yun Zhang, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15(2), 275-278 (1997).
32. E. H. C. Parker, The Technology and Physics of molecular Beam Epitaxy, Plenum, New York (1986).
33. J. R. Slack, J. C. Burfoot, Thin Solid Films 6, 233 (1970).
34. N. Beltran, V. Fuenzalida, C. Grahmann, Thin films of barium titanate for sensor devices, in "Euroceramics II, Electroceramics and ceramics for special applications, G. Ziegler and H. Husner, eds., Deutsche Keramische Gesellschaft, p.2475-79, (1991).
35. D. P. Stinton, T. M. Besmann, R. A. Lowden, Ceram. Bull. 67, 350 (1988).
36. R. Meissner, ed. (1988), MRS Bull. 13, 11 (10).
37. G. B. Stringfellow, J. Elec. Mater. 17, 327 (1988).
38. C. S. Chern, J. Zhao, L. Luo, P. Lu, Y. Q. Li, P. Norris, B. Kear, F. Cosandey, C. J. Maggiore, B. Gallois, B. J. Wilkens, Appl. Phys. Lett. 60, 1144 (1992).
39. D. L. Kaiser, M. D. Vaudin, L. D. Rotter, Z. L. Wang, J. P. Cline, C. S. Hwang, P. B. Marinenko, J. G. Gillen, ibid. 66, 2801 (1995).
40. Y. S. Yoon, M. N. Kang, H. S. Shin, S. S. Yom, T. W. Kim, J. Y. Lee, D. J. Choi, S-S. Baek, J. Appl. Phys. 73, 1547 (1993).
41. W. O. Benomar, S. S. Xue, R. A. Lessard, A. Singh, J. Mater. Res. 9, 970 (1994).
42. S. Kim, O. -Y. Kwon, Journal of Materials Science 34, 707 (1999).
43. S. Kim, T. Manabe, I. Yamaguchi, T. Kumagai, S. Mizuta, ibid. 12, 1141 (1997).
44. S. Kim, T. Manabe, I. Yamaguchi, T. Kumagai, S. Mizuta, Thin Solid Films 310, 199 (1997).
45. H. Basantakumar Sharma, H. N. K. Sarma, A. Mansingh, J. Mater. Sci. 34, 1385-1390 (1999).
46. Pilleux M. E., Fuenzalida V. M., J. Appl. Phys. 74, 4664 (1993).
47. C. -F. Kao, C. -L. Yang, J. Europ. Ceram. Soc. 19, 1356 (1999).
48. S. Senderoff, W. E. Reid, Jr., U. S. Pat. No. 2 843 541, (1958).
49. V. A. Lamb, H. I. Salmon, Am. Ceram. Soc. Bull. 41, 781-82 (1962).
50. M. Nagai, K. Yamashita, T. Umegaki, Y. Takuma, J. Am.Ceram. Soc. 76 (1), 253 (1993).
51. T. Hosokura, S. Shindo, M. Kuwabara, Key Engineering Materials, 248, 69 (2003). Trans. Tech. Publications, Switzerland.
52. M. Yoshimura, W. L. Suchanek, T. Watanabe, J. Eur. Ceram. Soc. 19, 1353 (1999).