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Volumn 81, Issue 3, 1998, Pages 768-772

Effects of plasma bombardment on the initial growth of (Ba,Sr)TiO3 films and their properties

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; FERROELECTRIC MATERIALS; FILM GROWTH; MAGNESIA; PERMITTIVITY; PLASMA APPLICATIONS; PLATINUM; SILICA; SILICON; SURFACE ROUGHNESS; TITANIUM OXIDES;

EID: 0032023491     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1998.tb02409.x     Document Type: Article
Times cited : (5)

References (16)
  • 2
    • 0043189644 scopus 로고    scopus 로고
    • Fabrication and Characterization of Electroceramic Thin Films for Semiconductor Memory Applications
    • National Tsing Hua University, Hsinchu, Taiwan
    • T. Y. Tseng, "Fabrication and Characterization of Electroceramic Thin Films for Semiconductor Memory Applications"; pp. 89-96 in Proceedings of the International Electron Devices and Materials Symposia. National Tsing Hua University, Hsinchu, Taiwan, 1996.
    • (1996) Proceedings of the International Electron Devices and Materials Symposia , pp. 89-96
    • Tseng, T.Y.1
  • 6
    • 85088002633 scopus 로고
    • Master's Thesis. National Tsing-Hua University, Hsinchu, Taiwan
    • 3 Thin Films"; Master's Thesis. National Tsing-Hua University, Hsinchu, Taiwan, 1995.
    • (1995) 3 Thin Films
    • Dong, J.S.1
  • 7
    • 0031198255 scopus 로고    scopus 로고
    • Characterization of Yttria-Stabilized-Zirconia Thin Films Grown by Planar Magnetron Sputtering
    • W. C. Tsai and T. Y. Tseng, "Characterization of Yttria-Stabilized-Zirconia Thin Films Grown by Planar Magnetron Sputtering," Thin Solid Films. 306, 86-91 (1997).
    • (1997) Thin Solid Films , vol.306 , pp. 86-91
    • Tsai, W.C.1    Tseng, T.Y.2
  • 8
    • 0016083153 scopus 로고
    • Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coatings
    • J. A. Thornton, "Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coatings," J. Vac. Sci. Technol., 11 [4] 666-70 (1974).
    • (1974) J. Vac. Sci. Technol. , vol.11 , Issue.4 , pp. 666-670
    • Thornton, J.A.1
  • 9
    • 84953682805 scopus 로고
    • The Microstructure of Sputter-Deposited Coatings
    • J. A. Thornton, "The Microstructure of Sputter-Deposited Coatings," J. Vac. Sci. Technol., A4 [6] 3059-65 (1986).
    • (1986) J. Vac. Sci. Technol. , vol.A4 , Issue.6 , pp. 3059-3065
    • Thornton, J.A.1
  • 11
    • 0041874155 scopus 로고
    • Reflection High-Energy Electron Diffraction Oscillations during Epitaxial Growth of High-Temperature Superconducting Oxides
    • T. Terashima, Y. Bando, K. Iijima, K. Yamamoto, K. Hirata, K. Hayashi, K. Kamigaki, and H. Terauchi, "Reflection High-Energy Electron Diffraction Oscillations during Epitaxial Growth of High-Temperature Superconducting Oxides," Phys. Rev. Lett., 65 [21] 2684-87 (1990).
    • (1990) Phys. Rev. Lett. , vol.65 , Issue.21 , pp. 2684-2687
    • Terashima, T.1    Bando, Y.2    Iijima, K.3    Yamamoto, K.4    Hirata, K.5    Hayashi, K.6    Kamigaki, K.7    Terauchi, H.8
  • 12
    • 0027666893 scopus 로고
    • 3 Thin Films by RF Magnetron Sputtering
    • 3 Thin Films by RF Magnetron Sputtering," Jpn. J. Appl. Phys., 32 [9B] 4115-17 (1993).
    • (1993) Jpn. J. Appl. Phys. , vol.32 , Issue.9 B , pp. 4115-4117
    • Ichinose, N.1    Ogiwara, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.