-
1
-
-
84954092281
-
3
-
3," Tech. Dig. - Int. Electron Devices Meet., 91, 823-26 (1991).
-
(1991)
Tech. Dig. - Int. Electron Devices Meet.
, vol.91
, pp. 823-826
-
-
Koyama, K.1
Sakuma, T.2
Yamamichi, S.3
Watanabe, H.4
Aoki, H.5
Ohya, S.6
Miyasaka, Y.7
Kikkawa, T.8
-
2
-
-
0043189644
-
Fabrication and Characterization of Electroceramic Thin Films for Semiconductor Memory Applications
-
National Tsing Hua University, Hsinchu, Taiwan
-
T. Y. Tseng, "Fabrication and Characterization of Electroceramic Thin Films for Semiconductor Memory Applications"; pp. 89-96 in Proceedings of the International Electron Devices and Materials Symposia. National Tsing Hua University, Hsinchu, Taiwan, 1996.
-
(1996)
Proceedings of the International Electron Devices and Materials Symposia
, pp. 89-96
-
-
Tseng, T.Y.1
-
3
-
-
18544401526
-
3 Thin Films on a Thick Storage Node of Ru
-
3 Thin Films on a Thick Storage Node of Ru," Tech. Dig. - Int. Electron Devices Meet., 95, 115-18 (1995).
-
(1995)
Tech. Dig. - Int. Electron Devices Meet.
, vol.95
, pp. 115-118
-
-
Yuuki, A.1
Yamamuka, M.2
Makita, T.3
Horikawa, T.4
Shibano, T.5
Hirano, N.6
Maeda, H.7
Mikami, N.8
Ono, K.9
Ogata, H.10
Abe, H.11
-
6
-
-
85088002633
-
-
Master's Thesis. National Tsing-Hua University, Hsinchu, Taiwan
-
3 Thin Films"; Master's Thesis. National Tsing-Hua University, Hsinchu, Taiwan, 1995.
-
(1995)
3 Thin Films
-
-
Dong, J.S.1
-
7
-
-
0031198255
-
Characterization of Yttria-Stabilized-Zirconia Thin Films Grown by Planar Magnetron Sputtering
-
W. C. Tsai and T. Y. Tseng, "Characterization of Yttria-Stabilized-Zirconia Thin Films Grown by Planar Magnetron Sputtering," Thin Solid Films. 306, 86-91 (1997).
-
(1997)
Thin Solid Films
, vol.306
, pp. 86-91
-
-
Tsai, W.C.1
Tseng, T.Y.2
-
8
-
-
0016083153
-
Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coatings
-
J. A. Thornton, "Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coatings," J. Vac. Sci. Technol., 11 [4] 666-70 (1974).
-
(1974)
J. Vac. Sci. Technol.
, vol.11
, Issue.4
, pp. 666-670
-
-
Thornton, J.A.1
-
9
-
-
84953682805
-
The Microstructure of Sputter-Deposited Coatings
-
J. A. Thornton, "The Microstructure of Sputter-Deposited Coatings," J. Vac. Sci. Technol., A4 [6] 3059-65 (1986).
-
(1986)
J. Vac. Sci. Technol.
, vol.A4
, Issue.6
, pp. 3059-3065
-
-
Thornton, J.A.1
-
10
-
-
36449004242
-
3 Films on Pt Electrodes by Reactive Evaporation
-
3 Films on Pt Electrodes by Reactive Evaporation." J. Appl. Phys., 76 [12] 7833-38 (1994).
-
(1994)
J. Appl. Phys.
, vol.76
, Issue.12
, pp. 7833-7838
-
-
Yano, Y.1
Iijima, K.2
Daitoh, Y.3
Terashima, T.4
Bando, Y.5
Watanabe, Y.6
Kasatani, H.7
Terauchi, H.8
-
11
-
-
0041874155
-
Reflection High-Energy Electron Diffraction Oscillations during Epitaxial Growth of High-Temperature Superconducting Oxides
-
T. Terashima, Y. Bando, K. Iijima, K. Yamamoto, K. Hirata, K. Hayashi, K. Kamigaki, and H. Terauchi, "Reflection High-Energy Electron Diffraction Oscillations during Epitaxial Growth of High-Temperature Superconducting Oxides," Phys. Rev. Lett., 65 [21] 2684-87 (1990).
-
(1990)
Phys. Rev. Lett.
, vol.65
, Issue.21
, pp. 2684-2687
-
-
Terashima, T.1
Bando, Y.2
Iijima, K.3
Yamamoto, K.4
Hirata, K.5
Hayashi, K.6
Kamigaki, K.7
Terauchi, H.8
-
12
-
-
0027666893
-
3 Thin Films by RF Magnetron Sputtering
-
3 Thin Films by RF Magnetron Sputtering," Jpn. J. Appl. Phys., 32 [9B] 4115-17 (1993).
-
(1993)
Jpn. J. Appl. Phys.
, vol.32
, Issue.9 B
, pp. 4115-4117
-
-
Ichinose, N.1
Ogiwara, T.2
-
15
-
-
0026120442
-
Buffer Layers for High-Quality Epitaxial YBCO Films on Si
-
D. K. Fork, D. B. Fenner, A. Barrera, J. M. Phillips, T. H. Geballe, G. A. N. Connell, and J. B. Boyce, "Buffer Layers for High-Quality Epitaxial YBCO Films on Si," IEEE Trans. Appl. Supercond., 1 [1] 67-73 (1991).
-
(1991)
IEEE Trans. Appl. Supercond.
, vol.1
, Issue.1
, pp. 67-73
-
-
Fork, D.K.1
Fenner, D.B.2
Barrera, A.3
Phillips, J.M.4
Geballe, T.H.5
Connell, G.A.N.6
Boyce, J.B.7
|