Characteristics of nano-electrostatic actuator fabricated by focused ion beam chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 10, 2004, Pages 7187-7191

  Kometani, Reo ^a,b   Hoshino, Takayuki ^b,c   Kondo, Kazushige ^b   Kanda, Kazuhiro ^a,b   Haruyama, Yuichi ^a,b   Kaito, Takashi ^d   Fujita, Jun Ichi ^b,e   Ishida, Masahiko ^b,f   Ochiai, Yukinori ^b,f   Matsui, Shinji ^a,b  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d SII NANOTECHNOLOGY INC   (Japan)

^e UNIVERSITY OF TSUKUBA   (Japan)

^f NEC CORPORATION   (Japan)

Author keywords

Focused ion beam chemical vapor deposition (FIB CVD); Nano electrostatic actuator; Nano electrostatic manipulator; Nanomechanical device; Three dimensional (3D)

Indexed keywords

CAPILLARITY; CHEMICAL VAPOR DEPOSITION; GLASS; ION BEAMS; MANIPULATORS; NANOSTRUCTURED MATERIALS; OPTICAL MICROSCOPY; RAMAN SPECTROSCOPY; THREE DIMENSIONAL;

FOCUSED-ION-BEAM CHEMICAL-VAPOR-DEPOSITION (FIB-CVD); NANO-ELECTROSTATIC ACTUATORS; NANO-ELECTROSTATIC MANIPULATOR; NANOMECHANICAL DEVICE;

ELECTROSTATIC ACTUATORS;

EID: 10844256657     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.7187     Document Type: Article

References (4)

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