Development of structural analysis method based on reverse Monte Carlo simulation and its application to catalytic chemical vapor deposition hydrogenated amorphous silicon

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 10, 2004, Pages 6873-6879

  Tabuchi, Norikazu ^a   Kawahara, Toshio ^b   Arai, Takashi ^b   Morimoto, Jun ^b   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

3D atomic model; Amorphous silicon; Cat CVD; Catalytic CVD; Coordination number; Hot Wire CVD; Hydrogenated amorphous silicon (a Si:H); Reverse Monte Carlo (RMC) simulation; Structural analysis

Indexed keywords

AMORPHOUS SILICON; CATALYSIS; ELECTRON DIFFRACTION; FUNCTIONS; INFRARED SPECTROSCOPY; MONTE CARLO METHODS; NEUTRON DIFFRACTION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; STRESS ANALYSIS; X RAY DIFFRACTION;

CAD-CVD; CATALYTIC-CVD; COORDINATION NUMBER; HOT-WIRE CVD; HYDROGENATED AMORPHOUS SILICON (A-SI:H); REVERSE MONTE CARLO (RMC); SMALL-ANGLE X-RAY SCATTERING (SAXS); THREEE-DIMENSIONAL (3D) ATOMIC MODEL;

STRUCTURAL ANALYSIS;

EID: 10844242297     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.6873     Document Type: Article

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