Ion beam mixing of ZnO/SiO 2 and Sb/Ni/Si interfaces under swift heavy ion irradiation

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 1129-1134

  Kraft, Saskia ^a   Schattat, Beate ^a   Bolse, Wolfgang ^a   Klaumünzer, Siegfried ^b   Harbsmeier, Felix ^c   Kulinska, Agnieszka ^c   Löffl, Anton ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

^c UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC SYSTEMS; ELECTRONIC ENERGY DEPOSITION; ELECTRONIC STOPPING POWER; HIGH-ENERGY ION IRRADIATION; HIGH-ENERGY IRRADIATION; INTERFACE CONCENTRATIONS; INTERFACE MIXING; ION BEAM MIXING; ION ENERGIES; ION TRACK; MIXING BEHAVIORS; MIXING EFFICIENCY; NUCLEAR STOPPING; PHASE FORMATIONS; RUTHERFORD BACK-SCATTERING SPECTROMETRY; STRONG-MIXING; SWIFT HEAVY ION IRRADIATION; THIN LAYERS; ZNO;

HEAVY IONS; HIGH ENERGY PHYSICS; IRRADIATION; QUARTZ; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

MIXING;

EID: 0036470093     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1425439     Document Type: Article

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