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Volumn 474, Issue 1-2, 2005, Pages 217-221
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The relationship between wafer surface pressure and wafer backside loading in Chemical Mechanical Polishing
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Author keywords
Backside loading; Chemical Mechanical Polishing (CMP); Pressure distribution
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Indexed keywords
COMPRESSIBILITY;
COMPUTER SIMULATION;
ELASTICITY;
FINITE ELEMENT METHOD;
PRESSURE DISTRIBUTION;
SURFACE PROPERTIES;
BACKSIDE LOADING;
CONTACT PRESSURE;
MATERIAL REMOVAL;
WAFER SURFACES;
CHEMICAL MECHANICAL POLISHING;
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EID: 10844238794
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2004.09.010 Document Type: Article |
Times cited : (40)
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References (17)
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