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Volumn 474, Issue 1-2, 2005, Pages 217-221

The relationship between wafer surface pressure and wafer backside loading in Chemical Mechanical Polishing

Author keywords

Backside loading; Chemical Mechanical Polishing (CMP); Pressure distribution

Indexed keywords

COMPRESSIBILITY; COMPUTER SIMULATION; ELASTICITY; FINITE ELEMENT METHOD; PRESSURE DISTRIBUTION; SURFACE PROPERTIES;

EID: 10844238794     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.010     Document Type: Article
Times cited : (40)

References (17)
  • 2
    • 10844259274 scopus 로고    scopus 로고
    • Ph.D. thesis, Department of Electrical Engineering and Computer Science, MIT, USA
    • D.O. Ouma, Ph.D. thesis, Department of Electrical Engineering and Computer Science, MIT, USA, 1998.
    • (1998)
    • Ouma, D.O.1
  • 12
    • 85040875608 scopus 로고
    • Cambridge Univ. Press, Great Britain
    • K.L. Johnson, Contact Mechanics, Cambridge Univ. Press, Great Britain, 1985.
    • (1985) Contact Mechanics
    • Johnson, K.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.