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Volumn 224, Issue 1-4, 2004, Pages 134-138
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Selective epitaxial growth of Ge quantum dots on patterned SiO 2 /Si(0 0 1) surfaces
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Author keywords
Quantum dots (QDs); Selective epitaxial growth (SEG); SiO 2 Si windows
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
DECOMPOSITION;
ELECTRON BEAM LITHOGRAPHY;
EPITAXIAL GROWTH;
GERMANIUM;
MULTILAYERS;
OPTOELECTRONIC DEVICES;
PHONONS;
PHOTOLUMINESCENCE;
RAMAN SPECTROSCOPY;
SILICA;
SILICON;
TRANSMISSION ELECTRON MICROSCOPY;
SELECTIVE EPITAXIAL GROWTH (SEG);
SEMICONDUCTOR QUANTUM DOTS;
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EID: 10744226961
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2003.08.081 Document Type: Conference Paper |
Times cited : (8)
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References (13)
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