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Materials Science and Engineering: B

Volumn 114-115, Issue SPEC. ISS., 2004, Pages 345-348

A kinetic Monte Carlo annealing assessment of the dominant features from ion implant simulations

(6) Martin Bragado, I a Jaraiz, M a Castrillo, P a Pinacho, R a Rubio, J E a Barbolla, J a

a UNIVERSITY OF VALLADOLID (Spain)

Author keywords

Annealing; Interstitial; Simulation

Indexed keywords

ANNEALING; BORON; CONCENTRATION (PROCESS); DIFFUSION; MICROELECTRONIC PROCESSING; MONTE CARLO METHODS; SECONDARY ION MASS SPECTROMETRY; SUPERSATURATION;

ATOMISTIC KINETIC MONTE CARLO (KMC); ELECTRICAL DEACTIVATION; SELF-INTERSTITIAL SUPERSATURATION; TRANSIENT ENHANCED DIFFUSION (TED);

ION IMPLANTATION;

EID: 10644277093 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2004.07.060 Document Type: Conference Paper

Times cited : (2)

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