Atomistic modeling of complex silicon processing scenarios

Materials Research Society Symposium - Proceedings

Volumn 610, Issue , 2000, Pages

  Jaraiz, M ^a   Castrillo, P ^a   Pinacho, R ^a   Pelaz, L ^a   Barbolla, J ^a   Gilmer, G H ^a   Rafferty, C S ^a  

^a UNIVERSITY OF VALLADOLID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ARTIFICIAL INTELLIGENCE; COMPUTER SIMULATION; DATABASE SYSTEMS; MONTE CARLO METHODS; REACTION KINETICS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS;

ATOMISTIC MODELING; COMPLEX SILICON PROCESSING SCENARIOS; ULSI CIRCUITS;

SEMICONDUCTING SILICON;

EID: 0034439038     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-610-b11.1     Document Type: Conference Paper

References (13)