Preparation of carbon thin films from five-membered heterocyclic organic compounds by chemical vapor deposition

Thin Solid Films

Volumn 471, Issue 1-2, 2005, Pages 128-133

  Shimada, Shiro ^a   Hanai, Takako ^a   Yamamoto, Osamu ^b   Saitoh, Hidetoshi ^c  

^a HOKKAIDO UNIVERSITY   (Japan)

^b AKITA UNIVERSITY   (Japan)

^c NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Carbon; Chemical vapor deposition (CVD); Coating; Organic substances

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; ORGANIC COMPOUNDS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; VICKERS HARDNESS TESTING; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GROWTH RATES; HARD COATINGS; HIGH-PRECISION BEARINGS; ORGANIC SUBSTANCES;

THIN FILMS;

EID: 10644257673     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.05.003     Document Type: Article

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