Pt thin film collectors prepared by liquid-delivery metal-organic CVD using Pt(C2H5C5H4)(CH 3)3 for LiCoO2 thin film cathodes

Chemical Vapor Deposition

Volumn 9, Issue 6, 2003, Pages 321-325

  Choi, Woon Gi ^a   Choi, Eun Suck ^a   Yoon, Soon Gil ^a  

^a Chungnam National University   (South Korea)

Author keywords

Cathode films; Collector; LD MOCVD; Oxides; Platinum compounds; Trench structure

Indexed keywords

CATHODES; ELECTRIC CONDUCTIVITY; LITHIUM COMPOUNDS; MASS TRANSFER; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDATION RESISTANCE; PLATINUM COMPOUNDS; SILICON;

CATHODE FILMS; LIQUID-DELIVERY METALORGANIC CHEMICAL VAPOR DEPOSITION (LD-MOCVD) (LD; TRENCH STRUCTURES;

THIN FILMS;

EID: 10644242651     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306268     Document Type: Article

References (18)

1. S. I. Cho, S. G. Yoon, J. Electrochem. Soc. 2002, 149, A1584.
2. R. Kanno, H. Kudo, Y. Kawamoto, T. Kamiyama, F. Izumi, Y. Takeda, M. Takano, J. Solid State Chem. 1994, 110, 216.
3. K. A. Striebel, C. Z. Deng, S. J. Wen, E. J. Cairns, J. Electrochem. Soc. 1996, 143, 1821.
4. C. Marichal, J. Hirschinger, P. Granger, M. Menetrier, A. Roughier, C. Delmas, Inorg. Chem. 1995, 34, 1773.
5. M. Menetrier, I. Saadoune, S. Levasseur, C. Delmas, J. Mater. Chem. 1999, 9, 1135.
6. N. Imanish, M. Fujiyoshi, Y. Takeda, O. Yamamoto, M. Tabuchi, Solid State Ionics 1999, 118, 121.
7. G. Ceder, Y. M. Chiang, D. R, Sadoway, M. K. Aydinol, Y. I. Jang, B. Huang, Nature 1998, 392, 694.
8. J. B. Bates, G. R. Gruzalski, N. J. Dudney, C. F. Luck, X. Yu. Solid State Ionics 1994, 619, 70.
9. K. H. Hwang, S. H. Lee, S. K. Joo, J. Power Sources 1995, 54, 224.
10. K. H. Hwang, S. H. Lee, S. K. Joo, J. Electrochem. Soc. 1994, 141, 3296.
11. J. M. Lee, C. S. Hwang, H. J. Cho, C. G. Suk, H. J. Kim, J. Electrochem. Soc. 1998, 145, 1066.
12. J. M. Lee, S. Y. Kang, J. C. Shin, W. J. Kim, C. S. Hwang, H. J. Kim, Appl. Phys. Lett. 1999, 74, 3489.
13. Z. Xue, M. J. Strouse, D. K. Shuh, C. B. Knobler, H. D. Kaesz, R. F. Hicks, R. S. Williams, J. Am. Chem. Soc. 1989, 111, 8779.
14. J. H. Kwon, S. G. Yoon, Thin Solid Films 1997, 303, 136.
15. E. S. Choi, J. C. Lee, J. S. Hwang, S. G. Yoon, Jpn. J. Appl. Phys. 1999, 38, 5317.
16. MOCVD Materials for High Dielectric and Ferroelectric Thin Films catalog, 2002, Kojundo Chem. Lab. Co. Ltd, p. 4.
17. D. W. Shaw, Crystal Growth, Plenum, London 1974, p. 11.
18. M. Ohring, The Materials Science of Thin Films, Academic Press Inc., Boston, MA 1992, p. 179.