Effect of nitrogen surface doping on the work function and field emission of hydrogenated amorphous carbon films

Applied Physics A: Materials Science and Processing

Volumn 80, Issue 1, 2005, Pages 123-126

  Xu, J ^a,b   Mei, J ^a   Huang, X H ^a   Li, X ^a   Li, Z ^b   Li, W ^a   Chen, K ^a  

^a NANJING UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; DOPING (ADDITIVES); FIELD EMISSION DISPLAYS; HYDROGENATION; METHANE; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL TERMINATION; FILM SURFACES; HYDROGEN TERMINATION; PARALLEL PLATE ELECTRODES;

AMORPHOUS FILMS;

EID: 10644236262     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2921-6     Document Type: Article

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