Influence of the nitrogen content on the field emission properties of a-CN x films prepared by pulsed laser deposition

Applied Surface Science

Volumn 197-198, Issue , 2002, Pages 316-320

  Fogarassy, E ^a   Szorenyi, T ^a,b   Antoni, F ^a   Stoquert, J P ^a   Pirio, G ^c   Olivier, J ^c   Legagneux, P ^c   Boher, P ^d   Pons Y Moll, O ^e  

^a Faculté de Médecine   (France)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

^c THALES RESEARCH AND TECHNOLOGY   (France)

^d SOPRA   (France)

^e UNIVERSITÉ PARIS DESCARTES   (France)

Author keywords

Carbon; Field emission; Nitrogen; Pulsed laser deposition; Surface roughness

Indexed keywords

CARBON NITRIDE; EXCIMER LASERS; FILM GROWTH; FILM PREPARATION; NITROGEN; PULSED LASER DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS;

FIELD EMISSION PROPERTIES;

AMORPHOUS FILMS;

EID: 0036419988     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00389-6     Document Type: Conference Paper

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