Chemical vapor deposition of individual single-walled carbon nanotubes using nickel sulfate as catalyst precursor

Journal of Physical Chemistry B

Volumn 108, Issue 48, 2004, Pages 18460-18462

  Liu, L W ^a,b   Fang, J H ^a   Lu, L ^a   Ma, Y J ^a   Zhang, Z ^a   Yang, H F ^a   Jin, A Z ^a   Gu, C Z ^a  

^a INSTITUTE OF PHYSICS   (China)

^b QIQIHAR UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

NICKEL SULFATE; NICKEL THIN FILMS; SINGLE-WALLED CARBON NANOTUBES (SWNT);

CATALYSTS; CHEMICAL VAPOR DEPOSITION; ELECTRIC FURNACES; NICKEL COMPOUNDS; RAMAN SPECTROSCOPY; SODIUM CHLORIDE; SUBSTRATES;

CARBON NANOTUBES;

EID: 10444279372     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp047721v     Document Type: Article

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