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H. Itatani et al., U. S. Patent 5502143 (1996).
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(1996)
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Itatani, H.1
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2
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0035478826
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New concept of positive photosensitive polyimide: Reaction development patterning (RDP)
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T. Fukushima, T. Oyama, T. Iijima, M. Tomoi, H. Itatani, "New Concept of Positive Photosensitive Polyimide: Reaction Development Patterning (RDP)", J. Polymer Science, Part A, Polymer Chemistry, Vol. 39 (2001), pp.3451-3463.
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(2001)
J. Polymer Science, Part A, Polymer Chemistry
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Fukushima, T.1
Oyama, T.2
Iijima, T.3
Tomoi, M.4
Itatani, H.5
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3
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0034764026
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Interlayer dielectric process for LSI circuits using positive photosensitive polyimide synthesized by block-copolymerization
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M. Aoyagi, S. Segawa, E. Jung, T. Itatani, M. Komuro, T. Sakamoto, H. Itatani, M. Miyamura, S. Matsumoto, "Interlayer Dielectric Process for LSI Circuits Using Positive Photosensitive Polyimide Synthesized by Block-Copolymerization," Proc. SPIE, vol. 4345 (2001), pp. 1073-1078.
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(2001)
Proc. SPIE
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Aoyagi, M.1
Segawa, S.2
Jung, E.3
Itatani, T.4
Komuro, M.5
Sakamoto, T.6
Itatani, H.7
Miyamura, M.8
Matsumoto, S.9
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4
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4644318591
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Development of high-density multilayer wiring package process using a photosensitive polyimide
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Kyoto, Japan, Nov
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th VLSI Packaging Workshop of Japan, Kyoto, Japan, Nov. 2002, pp. 43-46.
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(2002)
th VLSI Packaging Workshop of Japan
, pp. 43-46
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Kikuchi, K.1
Segawa, S.2
Jung, E.3
Nakagawa, H.4
Tokoro, K.5
Itatani, H.6
Aoyagi, M.7
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5
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0035300622
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Current status of research and development for three-dimensional chip stack technology
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K. Takahashi, H. Terao, Y. Tomita, Y. Yamaji, M. Hoshino, T. Sato, T. Morifuji, M. Sunohara, M. Bonkohara, "Current Status of Research and Development for Three-Dimensional Chip Stack Technology," Jpn. J. of Appl. Phys., Vol. 40 (2001), pp. 3032-3037.
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Takahashi, K.1
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Tomita, Y.3
Yamaji, Y.4
Hoshino, M.5
Sato, T.6
Morifuji, T.7
Sunohara, M.8
Bonkohara, M.9
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6
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0035751215
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Lithographic properties of positive photosensitive polyimide insulator by block copolymerization
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E. Jung, S. Segawa, T. Itatani, M. Komuro, H. Itatani, M. Miyamura, S. Matsumoto, M. Aoyagi, "Lithographic Properties of Positive Photosensitive Polyimide Insulator by Block Copolymerization," J. Photopolym. Sci. & Tech., Vol. 14, No. 1 (2001), pp. 61-66.
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Jung, E.1
Segawa, S.2
Itatani, T.3
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Itatani, H.5
Miyamura, M.6
Matsumoto, S.7
Aoyagi, M.8
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7
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4644371811
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Multilayer dielectric thin film process using solvent-soluble block copolyimide
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Montpellier, France, May
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th European Technical Symposium on Polyimides and High Performance Functional Polymers STEPI6, Montpellier, France, May. 2002, pp.215-222.
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(2002)
th European Technical Symposium on Polyimides and High Performance Functional Polymers STEPI6
, pp. 215-222
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Segawa, S.1
Jung, E.2
Nakagawa, H.3
Tokoro, K.4
Kikuchi, K.5
Itatani, H.6
Aoyagi, M.7
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