Lithographic properties of positive photosensitive polyimide insulator by block copolymerization

Journal of Photopolymer Science and Technology

Volumn 14, Issue 1, 2001, Pages 61-66

  Itatani, Taro ^a   Komuro, Masanori ^a   Aoyagi, Masahiro ^a   Jung, Bun Sil ^b   Segawa, Shigemasa ^b   Itatani, Hiroshi ^b   Miyamura, Masataka ^b   Matsumoto, Shunichi ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b PI Research and Development Company Limited

Author keywords

Alkaline developer; Dissolution inhibitor; Polyimide insulator; Positive photosensitive polyimide

Indexed keywords

ACID ANHYDRIDE; DIAMINE; LACTONE; POLYIMIDE; PYRIDINE; TETRAMETHYLAMMONIUM; TOLUENE;

ARTICLE; CATALYST; CHEMICAL ANALYSIS; DISSOLUTION; PHOTOSENSITIVITY; POLYMERIZATION; REACTION ANALYSIS; SOLUBILITY; SYNTHESIS;

EID: 0035751215     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.61     Document Type: Article

References (11)