Short-Wavelength Recording Properties of TeOx Thin Films

Chinese Physics Letters

Volumn 21, Issue 2, 2004, Pages 320-323

  Li, Qing Hui ^a   Gu, Dong Hong ^a   Gan, Fu Xi ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LASER BEAMS; TELLURIUM; THIN FILMS; VACUUM EVAPORATION;

ATOMIC-FORCE-MICROSCOPY; CARRIER TO NOISE RATIO; MATRIX; RECORDING MEDIA; RECORDING PROPERTIES; SHORT WAVELENGTHS; STATIC RECORDING TEST; THIN-FILMS; TWO COMPONENT SYSTEMS; WAVELENGTH LASERS;

TELLURIUM COMPOUNDS;

EID: 1042279144     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/21/2/029     Document Type: Article

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