Observation of short-wavelength recorded marks in TeO x thin film by atomic force microscopy

Applied Surface Science

Volumn 181, Issue 3-4, 2001, Pages 239-247

  Li, Qinghui ^a   Gan, Fuxi ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Atomic force microscope; Optical storage; Short wavelength recording; TeO x thin film

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; EVAPORATION; LASER BEAM EFFECTS; LIGHT REFLECTION; MICROSTRUCTURE; OPTICAL RECORDING; SURFACES; TELLURIUM COMPOUNDS;

SHORT-WAVELENGTH RECORDING;

THIN FILMS;

EID: 0035928966     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00386-5     Document Type: Article

References (16)