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Volumn 39, Issue 10 A, 2000, Pages
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Epitaxial growth and electrical characteristics of CaF2/Si/CaF2 resonant tunneling diode structures grown on Si(111) 1°-off substrate
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Author keywords
[No Author keywords available]
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Indexed keywords
CURRENT VOLTAGE CHARACTERISTICS;
EPITAXIAL GROWTH;
HEAT TREATMENT;
LEAKAGE CURRENTS;
MOLECULAR BEAM EPITAXY;
SEMICONDUCTING SILICON;
SEMICONDUCTOR QUANTUM WELLS;
VOLTAGE MEASUREMENT;
NEGATIVE DIFFERENTIAL RESISTANCE;
PARTIALLY IONIZED BEAM;
PEAK TO VALLEY CURRENT RATIO;
RESONANT TUNNELING DIODE;
ULTRAHIGH VACUUM CHAMBER;
TUNNEL DIODES;
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EID: 0034290944
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.l964 Document Type: Article |
Times cited : (66)
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References (12)
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