Interface-reaction-mediated formation of two-dimensional Si islands on CaF2

Applied Physics Letters

Volumn 82, Issue 25, 2003, Pages 4483-4485

  Klust, Andreas ^a,b   Grimsehl, Michael ^a   Wollschläger, Joachim ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^b UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALCIUM COMPOUNDS; CHEMICAL BONDS; FILM GROWTH; MORPHOLOGY; SILICON; SURFACE REACTIONS;

ULTRAHIGH-VACUUM NONCONTACT ATOMIC FORCE MICROSCOPY;

THIN FILMS;

EID: 0037707019     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1585126     Document Type: Article

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