Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2419-2423

  Zhang, Y J ^a,b   Yan, P X ^a   Wu, Z G ^a   Xu, J W ^a   Zhang, W W ^a   Li, X ^a   Liu, W M ^b   Xue, Q J ^b  

^a LANZHOU UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATHODES; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; LOW TEMPERATURE EFFECTS; MICROHARDNESS; PHYSICAL VAPOR DEPOSITION; STAINLESS STEEL; SURFACE ROUGHNESS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION RATE; NANOINDENTER; X-RAY DIFFRACTOMETER;

THIN FILMS;

EID: 10244242583     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1807836     Document Type: Article

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