Effect of substrate biasing on structural and field-emissive properties of carbon nanotubes synthesized by ICP-CVD method

Thin Solid Films

Volumn 469-470, Issue SPEC. ISS., 2004, Pages 142-148

  Park, Chang Kyun ^a   Kim, Jong Pil ^a   Kim, Young Do ^a   Uhm, Hyun Seok ^a   Park, Jin Seok ^a  

^a Hanyang University   (South Korea)

Author keywords

Carbon nanotubes (CNTs); Field emissive property; Inductively coupled plasma chemical vapor deposition (ICP CVD); Nanostructure; Substrate bias effect

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRON EMISSION; FILM GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL);

CATALYSTS PARTICLES; FIELD-EMISSIVE PROPERTY; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION (ICP-CVD); SUBSTRATE-BIAS EFFECTS;

CARBON NANOTUBES;

EID: 10044225661     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.102     Document Type: Article

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