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The authors wish to thank J. Hone, A. C. Johnson, and J. B. Miller for useful discussions, and H. Park for assistance with the design of the nanotube chemical vapor deposition system. This work was supported by funding from the NSF through the Harvard Materials Research Science and Engineering Center, the NSF under EIA-0210737, and the Army Research Office/Advanced Research and Development Authority Quantum Computing program. N.M. acknowledges support from the Harvard Society of Fellows. M.J.B. acknowledges support from an NSF Graduate Research Fellowship and from an ARO Quantum Computing Graduate Research Fellowship.
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