Structure, hardness, and elastic modulus of Pd/Ti nanostructured multilayer films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2584-2589

  Xu, Junhua ^a,b   Kamiko, Masao ^a   Sawada, Hidetaka ^a   Zhou, Yaomin ^a   Yamamoto, Ryoichi ^a   Yu, Lihua ^b   Kojima, Isao ^b  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; ELASTIC MODULI; HARDNESS; HIGH RESOLUTION ELECTRON MICROSCOPY; INDENTATION; MAGNETRON SPUTTERING; MICROACTUATORS; NANOSTRUCTURED MATERIALS; PALLADIUM; PRESSURE EFFECTS; SILICON WAFERS; SUPERLATTICES; SURFACE ROUGHNESS; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HARDNESS ENHANCEMENT; MODULATION PERIODS;

MULTILAYERS;

EID: 0942289260     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1624267     Document Type: Article

References (22)

1. J. S. Koehler, Phys. Rev. B 2, 547 (1970).
2. S. L. Lehoczky, J. Appl. Phys. 49, 5479 (1978).
3. U. Helmersson, S. Todorova, S. A. Barnett, J.-E. Sundgren, L. C. Markert, and J. E. Greene, J. Appl. Phys. 62, 481 (1987).
4. M. Shinn, L. Hultman, and S. A. Barnett, J. Mater. Res. 7, 901 (1992).
5. P. B. Mirkarimi, L. Hultman, and S. A. Barnett, Appl. Phys. Lett. 57, 2654 (1990).
6. X. Chu and S. A. Barnett, J. Appl. Phys. 77, 4403 (1995).
7. J. Xu, G. Li, and M. Gu, Thin Solid Films 370, 45 (2000).
8. J. Xu, M. Kamiko, Y. Zhou, R. Yamamoto, G. Li, and M. Gu, J. Appl. Phys. 89, 3674 (2001).
9. B. M. Clemens, H. Kung, and S. A. Barnett, Mater. Res. Bull. 24, 20 (1999).
10. R. C. Cammarata, T. E. Schlesinger, C. Kim, S. B. Qadri, and A. S. Edelstein, Appl. Phys. Lett. 56, 1862 (1990).
11. B. J. Daniels, W. D. Nix, and B. M. Clemens, Mater. Res. Soc. Symp. Proc. 343, 549 (1994).
12. C. Kim, S. B. Qadri, M. R. Scanlon, and R. C. Cammarata, Thin Solid Films 240, 52 (1994).
13. W. C. Oliver and G. M. Pharr, J. Mater. Res. 7, 1564 (1992).
14. H. E. Boyer, ed., Hardness Testing (American Society for Metals International, Metals Park, OH, 1987).
15. W. H. Soe and R. Yamamoto, Mater. Chem. Phys. 50, 176 (1997).
16. S.-M. Tadayyon, Y. Fujimoto, K. Tanaka, M. Doi, and M. Matsui, Jpn. J. Appl. Phys., Part 1 33, 4697 (1994).
17. W. Cahn, Acta Metall. 11, 1275 (1963).
18. Kato, T. Mori, and L. H. Schwartz, Acta Metall. 28, 285 (1980).
19. G. J. Taylor, J. Inst. Wet. 62, 307 (1938).
20. J. W. Matthews and A. E. Blakeslee, J. Cryst. Growth 27, 118 (1974).
21. J. Xu, M. Kamiko, Y. Zhou, G. Lu, L. Yu, I. Kojima, and R. Yamamoto, Appl. Phys. Lett. 81, 1189 (2002).
22. G. Li, Z. Han, J. Tian, J. Xu, and M. Gu, J. Vac. Sci. Technol. A 20, 674 (2002).