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Volumn 51, Issue 1, 2004, Pages 141-148

Efficacy of charge sharing in reshaping the surface electric field in high-voltage lateral RESURF devices

Author keywords

Device design; Device optimization; High voltage; LDMOS; Power ICs; RESURF technology

Indexed keywords

ELECTRIC FIELDS; OPTIMIZATION; SEMICONDUCTOR DOPING; TWO DIMENSIONAL;

EID: 0742321653     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2003.821383     Document Type: Article
Times cited : (78)

References (11)
  • 1
    • 0018714042 scopus 로고
    • High voltage thin layer devices (RESURF DEVICES)
    • J. Appels, H. Vaes, and J. Verhoeven, "High voltage thin layer devices (RESURF DEVICES)," in IEDM Tech. Dig., 1979, pp. 238-241.
    • (1979) IEDM Tech. Dig. , pp. 238-241
    • Appels, J.1    Vaes, H.2    Verhoeven, J.3
  • 3
    • 0019260851 scopus 로고
    • High voltage, high current lateral devices
    • H. Vaes and J. Appels, "High voltage, high current lateral devices," in IEDM Tech. Dig., 1980, pp. 87-90.
    • (1980) IEDM Tech. Dig. , pp. 87-90
    • Vaes, H.1    Appels, J.2
  • 4
    • 0019703894 scopus 로고
    • Effects of drift region parameters on the static properties of power LDMOST
    • S. Colak et al., "Effects of drift region parameters on the static properties of power LDMOST," IEEE Trans. Electron Devices, vol. ED-28, pp. 1455-1466, 1981.
    • (1981) IEEE Trans. Electron Devices , vol.ED-28 , pp. 1455-1466
    • Colak, S.1
  • 5
    • 0020287477 scopus 로고
    • Modeling and process implantation of implanted RESURF type devices
    • E. Wildi, P. Gray, T. Chow, H. Chang, and M. Cornell, "Modeling and process implantation of implanted RESURF type devices," in IEDM Tech. Dig., 1982, pp. 268-271.
    • (1982) IEDM Tech. Dig. , pp. 268-271
    • Wildi, E.1    Gray, P.2    Chow, T.3    Chang, H.4    Cornell, M.5
  • 6
    • 0030242274 scopus 로고    scopus 로고
    • A new analytical model for determination of breakdown voltage of RESURF structures
    • D. Krizaj, G. Charitat, and S. Amon, "A new analytical model for determination of breakdown voltage of RESURF structures," in Solid State Electron., vol. 39, 1996, pp. 1353-1358.
    • (1996) Solid State Electron. , vol.39 , pp. 1353-1358
    • Krizaj, D.1    Charitat, G.2    Amon, S.3
  • 9
    • 0041525408 scopus 로고    scopus 로고
    • Design and optimization of double-RESURF high-voltage lateral devices for a manufacturable process
    • Oct.
    • M. Imam, Z. Hossain, M. Quddus, J. Adams, C. Hoggatt, T. Ishiguro, and R. Nair, "Design and optimization of double-RESURF high-voltage lateral devices for a manufacturable process," IEEE Trans. Electron Devices, vol. 50, pp. 1697-1701, Oct. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , pp. 1697-1701
    • Imam, M.1    Hossain, Z.2    Quddus, M.3    Adams, J.4    Hoggatt, C.5    Ishiguro, T.6    Nair, R.7
  • 11
    • 0742276248 scopus 로고    scopus 로고
    • [Online]. Available: http://www.microsoft.com


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.