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Volumn 44, Issue 2, 2004, Pages 323-331

Al surface morphology effect on flip-chip solder bump shear strength

Author keywords

[No Author keywords available]

Indexed keywords

BALL SHEAR TEST; SOLDER BUMPS;

EID: 0742304129     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(03)00159-8     Document Type: Article
Times cited : (13)

References (7)
  • 1
    • 0033316204 scopus 로고    scopus 로고
    • Low cost wafer bumping processes for flip chip applications (electroless nickel-gold/stencil printing)
    • Chicago, USA
    • Strandjord JG, Popelar F, Erickson A. Low cost wafer bumping processes for flip chip applications (electroless nickel-gold/stencil printing). Proceedings of IMAPS, Chicago, USA, 1999.
    • (1999) Proceedings of IMAPS
    • Strandjord, J.G.1    Popelar, F.2    Erickson, A.3
  • 4
    • 0027132112 scopus 로고
    • The pretreatment of Al bond pads for electroless nickel bumping
    • Santa Cruz, CA
    • Ostmann A, Simon J, Reichl H. The pretreatment of Al bond pads for electroless nickel bumping. Proceeding of IEEE MCM Conference, Santa Cruz, CA, 1993. p. 748-51.
    • (1993) Proceeding of IEEE MCM Conference , pp. 748-751
    • Ostmann, A.1    Simon, J.2    Reichl, H.3
  • 5
    • 0032230479 scopus 로고    scopus 로고
    • The effects of immersion zincation to the electroless nickel under bump materials in microelectronics packaging
    • Singapore
    • Ng WC, Ko TM, Chen W, O GJ. The effects of immersion zincation to the electroless nickel under bump materials in microelectronics packaging, Proceeding of Second Electronics Packaging Technology Conference, Singapore, 1998. p. 89-94.
    • (1998) Proceeding of Second Electronics Packaging Technology Conference , pp. 89-94
    • Ng, W.C.1    Ko, T.M.2    Chen, W.3    O, G.J.4
  • 6
    • 0034270284 scopus 로고    scopus 로고
    • Under bump metallisation of fine pitch flip-chip using electroless nickel deposition
    • Liu C., Hutt A., Whalley D.C., Conway P.P. Under bump metallisation of fine pitch flip-chip using electroless nickel deposition. J Electron Manufact. 10(3):2000;161-170.
    • (2000) J Electron Manufact. , vol.10 , Issue.3 , pp. 161-170
    • Liu, C.1    Hutt, A.2    Whalley, D.C.3    Conway, P.P.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.