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Applied Physics A: Materials Science and Processing

Volumn 78, Issue 3, 2004, Pages 339-342

Deposition of thin polytetrafluoroethylene (PTFE) films using fundamental pulses of a Nd3+:YAG laser

(4) Tsuboi, Y a,b Kuro Oka, T a Irie, K a Itaya, A a

a KYOTO INSTITUTE OF TECHNOLOGY (Japan)

b Japan Science and Technology Agency (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GRAPHITE; INFRARED SPECTROSCOPY; LASER ABLATION; LASER PULSES; MONOMERS; PARTICLES (PARTICULATE MATTER); POLYMERIZATION; POLYTETRAFLUOROETHYLENES; PULSED LASER DEPOSITION; THERMAL DIFFUSION; THIN FILMS;

GRAPHITE PARTICLE; MONOMER REPOLYMERIZATION; PHOTOTHERMAL SENSITIZATION; POLYTETRAFLUOROETHYLENE FILM;

PLASTIC FILMS;

EID: 0742301704 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-002-2074-4 Document Type: Article

Times cited : (12)

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